The applications that are best suited to imprint today are

  • high resolution device patterning that  needs lower cost fabrication than electron beam direct write, and  
    does NOT require fine feature to feature overlay -  no overlay or overlay down to 200 nm is required. For
    example, Optics, Light emitting diodes (LED), Patterned media.

  • complex 3 dimensional structures in functional materials. For example; optical elements and bio
    structures

  • process research for fine overlay applications, typically  30% of the critical dimension. For example; dual
    damascene processes, molecular memory, defect studies for devices and molds, line width control
    evaluation.

The following are examples that have either been published, or have been discussed as possibilities.

OPTICS
Refractive
Diffractive
Subwavelength

OPTICAL DEVICES
LED
Solar Cells
Displays
Optical disk
Cameras

BIO
Separation
Cell culture
Lab on a chip

MATERIALS
Non wetting surfaces
Silicon recrystallization
Nanoporous films
Catalysts

MEMS
SAW
Molecular Motors
Microfluidics
Sensors

STORAGE
Hard disks - Patterned Media
Optical Disk

ELECTRONICS
Integrated Circuits
Contacts
Dual Damascene
FET
Microwave transistors
Quantum Devices
LED

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Applications