Semiconductor Blogs

2016

Imprint for semiconductors comes out of the closet at Advanced Lithography
Ready for nanoimprint ?

3D patterning news at Photonics West
3D construction ahead

2015

More updates
ReRAM Gains Even More Steam

New memory solutions
ReRAM Gains Steam

New transistors demand new materials
Manufacturing Of Next-Generation Channel Materials

Molecular Imprints is acquired
Molecular Imprints becomes a virtual reality company

Some thoughts on how Moore's law really can be extended
3 ways to reload Moore's law

New approaches to imaging both large and small  

5 reasons EUV will or will not be used
an interview with Matt Colburn of IBM regarding
data that speaks to the real status of EUV

The new year starts as usual with Photonics West

LIFT your 3D printing application

GaN on Si meets Si

Follow on thoughts on consortia with my annual
gratuitous use of a sport picture !
Are consortia fair competition ? – the NFL model

2014

Update to the story on next generation hard drives
Hard drive update - BPM achieves 1.3 T bit per squ. inch

                                                                                                               
Two articles on the role of big data in fab management
Predictive fab management
and
Big data in the fab

Will DSA and multi-patterning take over as CD's shrink ?
Directed self assembly - hype or revolution

The race between HAMR and patterned media
The uncertain future of hard drives

July - upgraded to Contributing writer at Semiengineering.com

Climate change and new business opportunity
The largest planet wide business opportunity….ever

What happens when shrinks no longer work ?
Beyond Moore's Law

Some thoughts on the most recent Cosmos episode on the age of the earth  .....
Defects And Contamination Control

Summaries from Photonics West 2014

Materials

Bio systems

I presented a paper on the technology of insulating
windows at Photonics West in Feb. SPIE Newsroom
asked for a short summary.
Identifying the best insulating windows

The final paper will be published  as
M. Watts
Design strategy for low emissivity windows with effective insulation,
Proc. SPIE 8981, p. 8981-53, 2014. (In press.)

The big news for imprint watchers, MII gets acquired
A Milestone In Imprint Lithography


A consortium celebrates a significant anniversary
IMEC’s 30th Anniversary: A Consortium With Impact

Happy New Year !
First thoughts ... Printed Electronics particularly after CES 2013
Printed electronics gets serious about manufacturing


2013

3D printing keeps getting new news
More 3D Printing Applications

Bringing back fond memories of managing software programs
Lessons from Healthcare.gov

Returning to more traditional patterning
3D Printing: Is This A Real Manufacturing Revolution?

Time to meet a patterning master
an octopus that cloaks with both color and texture

It's Printed Electronics season
Printed sensors enable new ways to interact with portable devices.

Back to displays
OLED displacing LCD but not affecting industry leaders.

Final thoughts from Adv. Litho.  
Directed Self Assembly, double patterning and crying in beer

Yet more from Adv. Litho
“More photons are good”, KLA’s new scatterometry tool provides another fine example.

Drill down at Adv. Litho...
Cymer’s EUV team has an exciting few months

It's time for SPIE Advanced Lithography
Extreme sources, block copolymers, and resist polishing
at SPIE Advanced Lithography.

Another blog from Photonics West
Optical interconnect for flexible electronics

New blog  
Pyramids are not just for Pharoes
LED and optics developments from Photonics West


New paper - a summary of developments in large area Wire Grid
Polarizers made by Agoura Technology. I will present two papers,
based on this work at SPIE Photonics West and SPIE Advanced Lithography  
A process for, and optical performance of, a low cost
Wire Grid Polarizer

2012

Printed electronics - IDTech update

Patterned Media - getting closer

2 blogs on SPIE's Photonics West  conference  

An customizable imaging spectrometer – otherwise known as a “hyperspatial imager”

High performance LED’s on Si wafers – the race is on

5 blogs on SPIE's Advanced Lithography conference

You Nits - a different way to think about nanolithography

Incumbency rules ! – in lithography as elsewhere.

Advanced Semiconductor Device Lithography - pushing the
optical limit for lithography   

Advanced Semiconductor Device Lithography - what is going to happen next ?   

Directed Self Assembly – record breaking small features


2011

Different wavelengths from one material – a new freedom in LED design  IEEE Photonics  

Transdermal patches – a maturing bio imprint application ?

IEEE Photonics Conference 2011 preview

How to Print an Electron

Printed electronics for RFID’s make progress

Nanomenhirs, a new opportunity for Obelix

Cell phone optics - imprint manufacturing

Patterned LED Substrates   

Photonic Cloaking Devices

HAMRing imprint or not

Imprint as the next NGL- the saga continues

Optics out of metals


2010

Impattern perspectives on the latest conference news have
been "Top 5 news stories" at Semiconductor International.

Photonic Crystals for LED's

2009

Miracle free applications for printed electronics

Next generation printed electronics  

Imprint developments    

PAPERS

Strategies for the fabrication of low cost molds


Advances in Roll to Roll Processing


Microfluidic Devices; Materials and Processes

Patterned Light Emitting Diodes